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CLEAN ROOM FOR SEMI-CONDUCTOR INDUSTRY APPLICATION

CLEAN ROOM FOR SEMI-CONDUCTOR INDUSTRY APPLICATION

 

Due to the sensitive nature of their products, clean room facilities for microelectronic and semiconductor applications require stringent environmental controls. These clean rooms also house extremely precise and expensive equipment such as photolithography, etching, cleaning, doping, and dicing machines. Hence, any deficiencies in the cleanliness specifications can affect the entire production process. Other common issues in microelectronic & semiconductor clean room conception and design are the maximizing of space while also enabling future reconfiguration. For all these reasons, a modular clean room system is often the optimal solution.

 

 

 

 

The kind of clean room application is one of its most important spaces since this is where the environment must be controlled to eliminate all dust, dampened against vibration, kept within narrow bands of temperature and humidity. Microelectronic & semiconductor clean rooms range from Class 100 to Class 100 000 depending on the processes taking place within the facility.

 

 

 

The clean room design must comply with the following requirements:

 

  • Air tightness
  • UV filtered light
  • non-retention of particles
  • non-proliferation of contaminating agents

 

For some applications, the cleanroom must also comply with specifications associated with electrostatic charges or discharges (ESD compatibility). Electrostatics can cause product contamination, product damage from electrostatic discharge (ESD) and production equipment malfunction caused by ESD-generated electromagnetic interference (EMI).

Special painted PPGI panels are ESD compliant. Controlling temperature and humidity is critical to minimize static electricity. This type of clean room can use high precision humidity (up to ±2%) and temperature (up to ±0.25°C) control systems

 

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